Chemical compositions of organosilicon thin films deposited on aluminium foil by atmospheric pressure dielectric barrier discharge and their electrochemical behaviour

Atmospheric pressure dielectric barrier discharge (AP-DBD) deposition of organosilicon thin films on aluminium foils was investigated over a range of discharge parameters. Scanning Electron Microscopy (SEM), Transmission Electron Microscopy (TEM), Fourier Transform Infrared Spectroscopy (FTIR) and X-ray Photoelectron Spectroscopy (XPS) analyses showed how variations of the plasma gas composition and deposition conditions affect the composition, structure and morphology of the films. The corrosion behaviour of the films was characterised by electrochemical techniques. Relationships between the deposition parameters, film chemistry and electrochemical properties of these films are reported.