Structurally laminated CrN films deposited by multi pulse modulated pulsed power magnetron sputtering

The paper presents the results on the deposition of nanoscale structurally laminated CrN films using a novel multi pulse modulated pulsed power (MPP) magnetron sputtering technique. With the multi pulse MPP approach, thin films with a structural modulation in the nanometer range are obtained by alternately switching two (or even more) high power MPP pulses on the same target, which have different pulse lengths, frequencies and powers. Each pulse was turned on for a pulse repeat duration during which this given pulse shape was repeated. In this study, CrN films have been deposited in a closed field unbalanced magnetron sputtering system using the multi pulse MPP technique by varying the pulse repeat duration of two different pulses. The CrN films were also deposited by dc magnetron sputtering (dcMS) and single pulse MPP techniques for comparison. The microstructure and properties of the films were characterized using glancing incident X-ray diffraction, scanning electron microscopy, transmission electron microscopy, nanoindentation, and ball-on-disk wear tests. The structure and properties of the multi pulse MPP CrN films depended on the pulse repeat duration. The highest hardness of 30.5 GPa and an H/E ratio of 0.9 have been achieved in the multi pulse MPP CrN films. The wear rate of the single pulse MPP and multi pulse MPP CrN films decreased by a factor of 5.8–17 as compared to the dcMS CrN films.