Chemical vapor deposition of rhenium on a gourd shaped graphite substrate

Chemical vapor deposition (CVD) of rhenium coatings on a gourd shaped graphite substrate is studied. Effects of deposition temperature, chlorine flow rate, total pressure and chlorination temperature on deposition rate, yield, morphology and texture of rhenium coating are investigated, respectively. Uniform rhenium coatings have been obtained by using proper combination of deposition conditions at an acceptable deposition rate and yield. The rhenium coatings consist of two sub-layers, i.e., an inner nucleation layer of fine equiaxed grains and an outer layer comprising oriented columnar grains. Although different surface morphologies have been observed, the grains of rhenium coatings are all <002> oriented. The tendency of the preferred orientation <002> is more significant with decreasing surface roughness of the coating.