Microstructure characterization and deposition mechanism studies of ZrO2 thin films deposited by LI-MOCVD

Zirconia (ZrO2) thin films were deposited by LI MOCVD technique using the precursor Zr(thd)4 over large ranges of deposition parameters. These films were studied by field emission gun scanning electron microscopy (FEG-SEM) for surface and cross-section morphologies. The crystalline structure and crystallographic texture evolution of obtained films were analyzed by X-ray diffraction. Based on those experimental results, two typical deposition mechanisms were discussed from the view of film morphologies and crystallographic texture evolutions. Besides, the influence of deposition conditions on the crystalline structures of ZrO2 films is studied, to bring information about the deposition of tetragonal phase ZrO2 films.