• Title of article

    Characteristics of amorphous carbon films prepared by hybrid RF (195 kHz) plasma triggered by shunting arc discharge

  • Author/Authors

    Takaki، نويسنده , , K. and Yukimura، نويسنده , , K. and Suda، نويسنده , , Y. and Ogiso، نويسنده , , H. and Nakano، نويسنده , , S.، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2013
  • Pages
    5
  • From page
    26
  • To page
    30
  • Abstract
    Hybrid plasma was generated by combining a burst methane radio frequency (rf) (195 kHz) plasma with a carbon shunting arc discharge. The methane rf plasma was triggered by the shunting arc discharge over a wide range of ambient gas pressures from as low as 0.045 Pa as a baseline pressure to a methane pressure of 0.84 Pa, which prevented the rf plasma from self-igniting. When a target was immersed in the rf- and shunting arc-hybrid plasma and a negative pulse voltage was applied to a disc electrode, carbon ions were extracted from the hybrid plasma and an amorphous carbon film was deposited on a silicon substrate mounted on the disc electrode. The carbon shunting arc significantly increased the ionisation of the methane gas initiated by the rf plasma. The plasma density in the hybrid plasma increased by a factor of 5–9 compared to that of the shunting arc discharge alone. The deposition rate of the carbon film also increased by adding the rf plasma component. The prepared films showed an amorphous structure characterised by D- and G-peaks in the Raman spectrum.
  • Keywords
    Shunting arc , Plasma-based ion implantation , Methane , Hybrid plasma , carbon
  • Journal title
    Surface and Coatings Technology
  • Serial Year
    2013
  • Journal title
    Surface and Coatings Technology
  • Record number

    1828003