Synthesis of tantalum thin films on titanium by plasma immersion ion implantation and deposition

In this work, tantalum and its oxide films were deposited onto titanium substrates using plasma immersion ion implantation and deposition, with the aim to combine the favorable properties of tantalum surface layers and titanium bulk materials. Elemental composition of titanium deposited tantalum and its oxide films were characterized by X-ray photoelectron spectrum. Electrochemical measurements were conducted to investigate the corrosion resistance of the samples and the results indicated that better corrosion resistance was obtained after the deposition of tantalum and its oxide films, which was attributed to the more stable tantalum oxide in the surface passive film. Bioactivity of titanium was improved after the deposition of tantalum and its oxide films, as bone-like apatite was able to form on the surfaces of titanium with tantalum and its oxide films soaked in simulated body fluid for 28 days. Moreover, MC3T3 cells were able to proliferate very well on the surfaces of samples, indicating that the excellent cytocompatibility of titanium substrates was maintained after the deposition of tantalum and its oxide films. The advantageous properties of titanium with tantalum and its oxide films implied that they are potential biomaterials for orthopaedic and dental implants.