Reactive sputter deposition of metal containing hydrogenated amorphous carbon coatings exhibiting self-assembled alternating nanolayers

A reactive magnetron sputtering deposition technique was used for the deposition of a-C:H/Me coatings on different substrates under various deposition conditions. Several metal targets, including Al, Si, Fe, Ni, Cu, and Pt, were used. Depending on the growth condition, metal type, and substrate material, the obtained a-C:H/Me coatings were found to exhibit various microstructures. The conditions that favor the formation of alternating nanolayer structure are studied and determined; therefore a processing window was obtained.