Graded nanostructured interfacial layers fabricated by high power pulsed magnetron sputtering — plasma immersion ion implantation and deposition (HPPMS–PIII&D)

A nanostructured interfacial layer with a graded structure is produced by hybrid high-power pulsed magnetron sputtering–plasma immersion ion implantation and deposition (HPPMS–PIII&D) to improve adhesion of multi-functional coatings. As a demonstration, a ceramic CrN film is prepared on stainless steel together with a Cr interlayer. High-resolution transmission electron microscopy (HR-TEM) reveals the presence of a 40 nm thick nanostructured interfacial layer between the Cr interlayer and substrate with gradually changing compositions, and this layer which possesses a dense and pore/void free structure is responsible for the strong film adhesion. The hybrid technology combines the benefits of both the HPPMS and PIII&D enabling fabrication of functional films with the desired properties. The technique and fabrication strategy have many potential applications in photovoltaics, energy storage, tribology, lubrication, aeronautics, and astronautics.