Title of article
Novel vinyl ether functionalized fluorene polymers for active incorporation into common photoresist matrices
Author/Authors
Kuehne، نويسنده , , Alexander J.C. and Mackintosh، نويسنده , , Allan R. and Pethrick، نويسنده , , R.A. and Tieke، نويسنده , , Bernd، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2008
Pages
3
From page
4722
To page
4724
Abstract
A novel vinyl ether functionalized fluorene monomer was prepared to produce a series of fluorene-based polymers with different emitter units to cover emission in the visible spectrum whilst retaining the same main absorption profile. The vinyl ether functionality allows for active incorporation of the light emitting polymers into standard vinyl ether and glycidyl ether photoresist materials. This enables photopatterning of light emitting structures for application in UV down-conversion, waveguiding and for lasing media.
Keywords
Polymer blends , conjugated polymer , Photolithography , Vinyl ether functionalized fluorene , Crosslinkable polymer , photoresist
Journal title
Tetrahedron Letters
Serial Year
2008
Journal title
Tetrahedron Letters
Record number
1860441
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