Title of article
Faceting of Si nanocrystals embedded in SiO2
Author/Authors
Wang، نويسنده , , Y.Q. and Smirani، نويسنده , , R. and Schiettekatte، نويسنده , , F. and Ross، نويسنده , , G.G.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2005
Pages
5
From page
129
To page
133
Abstract
Faceting has been observed in some Si nanocrystals (Si nc) embedded in SiO2 using high-resolution transmission electron microscopy (HRTEM). Statistical analyses of the interface-energy (Si nc/SiO2) ratios for different facets of the single-crystalline Si nc have been carried out. For these single-crystalline Si nc, the interfacial energy ratios of {1 0 0} and {1 1 3} relative to {1 1 1} facets, are 1.1 and 0.89, respectively. The influences of planar defects such as twins and stacking faults on the faceting and interfacial energy of Si nc/SiO2 are discussed in terms of their possible contribution to the interfacial energy.
Journal title
Chemical Physics Letters
Serial Year
2005
Journal title
Chemical Physics Letters
Record number
1915696
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