• Title of article

    TiO2 nanotube layers: Dose effects during nitrogen doping by ion implantation

  • Author/Authors

    Ghicov، نويسنده , , Andrei and Macak، نويسنده , , Jan M. and Tsuchiya، نويسنده , , Hiroaki and Kunze، نويسنده , , Julia and Haeublein، نويسنده , , Volker and Kleber، نويسنده , , Sebastian and Schmuki، نويسنده , , Patrik، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2006
  • Pages
    4
  • From page
    426
  • To page
    429
  • Abstract
    TiO2 nanotubes were produced by self-organized electrochemical oxidation of Ti. The tubes were N-ion implanted at two nominal fluencies, 1 × 1015 and 1 × 1016 ions/cm2. Implantation was carried out into amorphous and crystalline (anatase) tubes. lectrochemical, SEM and XRD measurements show successful doping at a dose of 1 × 1016 ions/cm2, however the ion implantation process causes strong structural alterations. Amorphous tubes show a disintegration of the morphological integrity, while anatase tubes are ‘amorphized’. This amorphization leads to a decrease of photoresponse in the UV range, but the N-doping results in a strong sub-band gap response.
  • Journal title
    Chemical Physics Letters
  • Serial Year
    2006
  • Journal title
    Chemical Physics Letters
  • Record number

    1917634