The influence of O2 partial pressure on the structure and surface wettability of C-modified TiO2 films prepared by magnetron co-sputtering

C-modified TiO2 films have been deposited on slide glass substrates by magnetron reactive co-sputtering using titanium and graphite as targets. The influence of different oxygen partial pressures on the phase transition, microstructure and surface wettability of C-modified TiO2 films was investigated. The films were characterized by XPS, XRD, Raman spectra, SEM and AFM. Sample structure transferred from composite rutile-anatase to anatase with increasing oxygen partial pressure. The wettability transformation of different films under UV light irradiation was also discussed.