• Title of article

    Thermochemistry for silicic acid formation reaction: Prediction of new reaction pathway

  • Author/Authors

    Mondal، نويسنده , , Bhaskar and Ghosh، نويسنده , , Deepanwita and Das، نويسنده , , Abhijit K.، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2009
  • Pages
    5
  • From page
    115
  • To page
    119
  • Abstract
    Reaction between SiO2 and water has been studied extensively using ab initio methods. The mechanism for formation of metasilicic acid SiO(OH)2 and orthosilicic acid Si(OH)4 has been explored and a new pathway for formation of Si(OH)4 is predicted. Heats of reaction ( Δ r H 298 ∘ ) and heats of formation ( Δ f H 298 ∘ ) at 298 K for the related reactions and species calculated at two different theoretical levels G3B3 and G3MP2B3 agree well with the literature values. It is found that when SiO2 reacts simultaneously with two water molecules, the thermodynamic as well as kinetic feasibility of the process is much greater than that when SiO2 reacts with one molecule of water.
  • Journal title
    Chemical Physics Letters
  • Serial Year
    2009
  • Journal title
    Chemical Physics Letters
  • Record number

    1927258