• Title of article

    Ti-doped AlN potential n-type ferromagnetic semiconductor: Density functional calculations

  • Author/Authors

    Fan، نويسنده , , S.W. and Yao، نويسنده , , K.L. and Huang، نويسنده , , Z.G. and Zhang، نويسنده , , J. and Gao، نويسنده , , G.Y. and Du، نويسنده , , G.H.، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2009
  • Pages
    4
  • From page
    62
  • To page
    65
  • Abstract
    The magnetism and the electronic structures of Ti-doped AlN are studied by the first-principles calculations. It is found that Ti prefers to substitute Al site in AlN host, and this doped configuration favors the ferromagnetic ground state. The magnetic moment of the supercell containing single TiAl is 1.00 μB. Electronic structures suggest magnetic moments mainly come from the doped Ti atom, Ti-doped AlN is n-type ferromagnetic semiconductor and the ferromagnetism can be explained by double-exchange mechanism. For O and Ti co-doped AlN, calculations show ON defect would induce magnetic moments increasing and change Ti-doped AlN from semiconductor to metal.
  • Journal title
    Chemical Physics Letters
  • Serial Year
    2009
  • Journal title
    Chemical Physics Letters
  • Record number

    1927797