Title of article :
Temperature-dependent nitrogen configuration of N-doped graphene by chemical vapor deposition
Author/Authors :
Sui، نويسنده , , Yanping and Zhu، نويسنده , , Bo and Zhang، نويسنده , , Haoran and Shu، نويسنده , , Haibo and Chen، نويسنده , , Zhiying and Zhang، نويسنده , , Yanhui and Zhang، نويسنده , , Yaqian and Wang، نويسنده , , Bin and Tang، نويسنده , , Chunmiao and Xie، نويسنده , , Xiaoming and Yu، نويسنده , , Guanghui and Jin، نويسنده , , Zhi and Liu، نويسنده , , Xinyu، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2015
Pages :
7
From page :
814
To page :
820
Abstract :
The N-doped graphene domain is synthesized through co-growth of ammonia and methane by chemical vapor deposition (CVD). Results showed that the nitrogen concentration, defect density, and doping level increased with the decrease in growth temperature. Notably, the position of N1s main peak from X-ray photoelectron spectroscopy (XPS) showed a significant linear blueshift as the temperature decreased, indicating that the main doping nitrogen configuration gradually evolved from pyridinic N to pyrrolic N consistent with the theoretical explanation. In addition, the nitrogen configuration was not influenced by the NH3 flow rate, which was mainly pyridinic N at the high temperature. With increasing NH3 flow rate the redshift of the Raman peak was caused by the elongation of the CC bonds. This work presented a process to control the predominant bonding configuration of doping nitrogen by mainly choosing the growth temperature through CVD.
Journal title :
Carbon
Serial Year :
2015
Journal title :
Carbon
Record number :
1929762
Link To Document :
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