Title of article :
Correlated sputtering from a hydrogen-terminated Si surface by individual highly charged ion impacts
Author/Authors :
Tona، نويسنده , , Masahide and Sakurai، نويسنده , , Makoto and Yamada، نويسنده , , Chikashi and Ohtani، نويسنده , , Shunsuke، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2010
Pages :
4
From page :
81
To page :
84
Abstract :
The interaction of slow iodine highly charged ions (HCIs), Iq+, with a hydrogen-terminated Si(1 1 1)-(1 × 1) surface was investigated for a wide range of q from 17 to 53 (fully stripped ion). The coincidence measurement for secondary ion emission reveals that correlated sputtering is enhanced toward higher q, that is, while Si+ sputtering is anti-correlated with H+, multiple H+ are simultaneously emitted. The direct observation of the HCI-bombarded surface with a scanning tunneling microscope supports the result of the multiple hydrogen emission. These results are discussed in consideration of the strong Coulomb interaction of incident HCIs with the surface and subsurface atoms.
Journal title :
Chemical Physics Letters
Serial Year :
2010
Journal title :
Chemical Physics Letters
Record number :
1929975
Link To Document :
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