Author/Authors :
Niphadkar، نويسنده , , P.S. and Bhange، نويسنده , , D.S. and Selvaraj، نويسنده , , K. and Joshi، نويسنده , , P.N.، نويسنده ,
Abstract :
An in situ high temperature X-ray diffraction study was carried out for investigating the thermal expansion properties of Si-MFI and SnSi-MFI molecular sieves. The thermal stability up to 973 K and a negative lattice thermal expansion in anisotropic manner was exhibited by both the phases in the temperature range of 373–973 K. The trend observed in contraction along the axes was as: a > c > b. The substitution of Sn4+ in MFI framework resulted in an expansion of unit cell volume and in an increase in the lattice thermal expansion coefficient in the temperature range 423–973 K.