Title of article
Development and annealing of colloidal multilayer structures of silica microspheres
Author/Authors
Gathania، نويسنده , , Arvind K. and Dhiman، نويسنده , , Naresh and Sharma، نويسنده , , Ankita and Singh، نويسنده , , B.P.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2011
Pages
4
From page
34
To page
37
Abstract
Colloidal multilayer structures of silica microspheres have been developed on the quartz substrates using vertical deposition technique and effect of annealing on optical properties of samples was investigated using UV–Visible spectroscopy. It is noticed that forbidden photonic band gap is a function of annealing temperatures and annealing times. Morphology of particles was characterized using scanning electron microscope (SEM), transmission electron microscope (TEM) and X-ray diffraction (XRD). SEM and TEM micrographs illustrate the uniform size distribution of silica microspheres with an average size of 280 nm.
Keywords
Colloidal multilayer structures , microspheres , Scanning electron microscope , Forbidden photonic band gap
Journal title
Colloids and Surfaces A Physicochemical and Engineering Aspects
Serial Year
2011
Journal title
Colloids and Surfaces A Physicochemical and Engineering Aspects
Record number
1939657
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