A matrix isolation study of the reactions of OVCl3 with a series of silanes

The reactions between OVCl3 and a series of silanes have been investigated using matrix isolation infrared spectroscopy. Twin-jet co-deposition of the two reagents into argon matrices at 14 K followed by irradiation with light of λ>300 nm led to the growth of a number of new bands. These have been assigned to the appropriate silanol species formed by oxygen insertion into the Si–H bond, complexed to VCl3. The structures and vibrational frequencies of these complexes have been characterized by high-level theoretical calculations. These calculations also support the relative preference for the insertion reaction compared to other possible pathways.