Title of article :
Investigation of the gas-phase structure and rotational barrier of trimethylsilyl trifluoromethanesulfonate and comparison with covalent sulfonates
Author/Authors :
Defonsi Lestard، نويسنده , , Marيa E. and Tuttolomondo، نويسنده , , Marيa E. and Varetti، نويسنده , , Eduardo L. and Wann، نويسنده , , Derek A. and Robertson، نويسنده , , Heather E. and Rankin، نويسنده , , David W.H. and Altabef، نويسنده , , Aida Ben، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2010
Abstract :
The molecular structure of trimethylsilyl trifluoromethanesulfonate, CF3SO2OSi(CH3)3, has been determined in the gas phase from electron-diffraction data supplemented by ab initio (MP2) and DFT calculations using 6-31G(d), 6-311++G(d,p) and 6-311G++(3df,3pd) basis sets. Both experimental and theoretical data indicate that only one gauche conformer is possible by rotating about the O–S bond. The anomeric effect is a fundamental stereoelectronic interaction and presents a profound influence on the electronic geometry. We have investigated the origin of the anomeric effect by means of NBO and AIM analysis. A natural bond orbital analysis showed that the lpπ[O bonded to Si)] → σ*[C–S] hyperconjugative interaction favors the gauche conformation. In addition, comparison of the structural and stereoelectronic properties of the title molecule with those of silyl trifluoromethanesulfonate and methyl trifluoromethanesulfonate has been carried out.
Keywords :
Internal barrier to rotation , DFT calculations , Ab initio calculations , Fourier-type expansion , Natural Bond Orbital analysis , Gas electron diffraction
Journal title :
Journal of Molecular Structure
Journal title :
Journal of Molecular Structure