Far-infrared emission of Ti-based oxides

Various Ti-based oxides were used as far-infrared (FIR) radiation sources. The temperature increases and emissivities of aluminum panels coated with these oxides were measured. To explain their different FIR emissivities, the electronic energy levels of these oxides were calculated using the direct-variational Xα molecular orbital method. Ti2O3 and TiO were found to be more effective materials as FIR sources than was TiO2 in the wavelength range 3–7 μm. The wide band gap of TiO2 is the cause of its relatively low emissivity.