Fabrication of cell pattern on poly(dimethylsiloxane) by vacuum ultraviolet lithography

Cell patterning on substrates has played a significant role in the study of basic biology, cell-based biosensor and tissue engineering. In this report, a cell pattern was prepared on poly(dimethylsiloxane) (PDMS) substrate by vacuum ultraviolet (VUV) lithography. After immobilizing allyl-polyethylene glycol (APEG) onto PDMS, a chemical heterogeneous patterned surface was fabricated by VUV (Xe2 excimer: 172 nm) lithography with copper mesh as a photomask. The UV exposed domains can promote L929 cell adhesion and growth. However, non-exposed regions resist cell attachment because of the repelling property of PEG. Therefore, cell pattern could be achieved without pre-adsorption of cell adhesive species before cell culture.