Novel functionalization of Ti-V alloy and Ti-II using atomic layer deposition for improved surface wettability

Surface wettability characteristics of commercially pure titanium (CP-Ti/Ti-II) and titanium Grade 5 alloy (Ti–6Al–4V/Ti-V) with 10 nm-thick atomic layer deposited (ALD) TiO2 from Tetrakis DiEthyl Amino Titanium and water vapor were studied in conjunction with cleaning steps before and after the ALD treatment. The wettability characteristics of rough Ti-II and Ti-V samples were investigated after each step, that is, as received, after de-ionized (DI) water rinse followed by N2 drying, sonication in methanol, ALD treatment, and post-ALD DI water rinse. Samples without ALD or cleaning treatments were hydrophobic to variable extents, depending on exposure to different environments, surface impurities, roughness, and aging. Surface treatments reported in the literature resulted in hydrophilic/hydrophobic surfaces likely due to organic and/or inorganic impurities. In this study, (i) it is established that it is critically important to probe surface wettability after each substrate treatment; (ii) both Ti-II and Ti-V surfaces are found to become more hydrophilic after each one of the sequential treatments used; and (iii) independently of the initial wettability characteristics of Ti-II and Ti-V surfaces, the aforementioned treatments result in a water contact angle well below 10°, which is an important factor in cellular response. X-ray photoelectron spectroscopy of ALD titania films indicated trace impurities in them. Grazing incidence X-ray diffraction suggested amorphous ALD TiO2 at 200 °C; anatase TiO2 was obtained with as little as 5 min annealing at 600 °C in nitrogen.