Title of article :
Balanced clusters and diffusion process in signed networks
Author/Authors :
Ehsani، Maryam Maryam نويسنده Dental Materials Research Center, School of Dentistry, Babol University of Medical Sciences, Babol, Iran. Ehsani, Maryam Maryam , Sepehri، Mohammad Mehdi نويسنده , Associate Professor, Industrial Engineering Department ,
Issue Information :
فصلنامه با شماره پیاپی سال 2014
Pages :
14
From page :
104
To page :
117
Abstract :
In this paper we study the topology effects on diffusion process in signed networks. Considering a simple threshold model for diffusion process, it is extended to signed networks and some appropriate definitions are proposed. This model is a basic model that could be extended and applied in analyzing dynamics of many real phenomena such as opinion forming or innovation diffusion in social networks. Studying the model declares that highly balanced dense clusters act as obstacles to diffusion process. This fact is verified by numerical simulations and it is declared that balanced dense clusters limit perturbation diffusion and the rest time. In other words the systems with more compatible communities and balanced clusters act more robust against perturbations. Moreover, the final state majority would be the same of more balanced cluster initially. These structural properties could be useful in analyzing and controlling diffusion process in systems.
Journal title :
Journal of Industrial and Systems Engineering (JISE)
Serial Year :
2014
Journal title :
Journal of Industrial and Systems Engineering (JISE)
Record number :
1986352
Link To Document :
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