Author/Authors :
Churin، نويسنده , , E.G and Koronkevich، نويسنده , , V.P and Kulipanov، نويسنده , , G.N and Makarov، نويسنده , , O.A and Mezentseva، نويسنده , , L.A and Nazmov، نويسنده , , V.P and Pindyurin، نويسنده , , V.F، نويسنده ,
Abstract :
X-ray lithography using synchrotron radiation from the VEPP-3 storage ring was applied for the fabrication of test specimens of some optical elements such as Fresnel lenses and arrays of optical elements for visible light.
ising advantage of the application of X-ray lithography is the possibility of micron scale patterning on curved surfaces. The patterns of Fresnel-like structures were generated by an annular laser photoplotter for the fabrication of an X-ray mask on a 2-μm-thick silicon membrane with a 1.5-μm-thick gold absorber. The X-ray lithography station at the VEPP-3 storage ring was used for deep X-ray lithography.
