Title of article
On the research of a post-lens deflector for a submicrometer lithography system
Author/Authors
Sheng Xia and Ding Shou-qian and Sun Jie، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1995
Pages
4
From page
79
To page
82
Abstract
The paper presented investigates the relation between the third order deflection aberration and the struction parameters of the post-lens deflection system of EBLS. The design of the deflection coil can be accurately realized by the WEDM technique.
Journal title
Nuclear Instruments and Methods in Physics Research Section A
Serial Year
1995
Journal title
Nuclear Instruments and Methods in Physics Research Section A
Record number
1995595
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