Fabrication of Nb and Ta/Al/AlOx/Al/Nb tunneling junction X-ray detectors: a list of problems
Author/Authors :
Nussbaumer، نويسنده , , Th and Finkbeiner، نويسنده , , F and Lerch، نويسنده , , Ph and Zehnder، نويسنده , , A and Ott، نويسنده , , H.R، نويسنده ,
Pages :
2
From page :
115
To page :
116
Abstract :
A whole wafer fabrication procedure using selective etching of refractory materials to produce Nb- or Ta/Al/AlOxAl/Nb tunneling X-ray detectors is discussed. Fabrication aspects and preliminary results are presented.
