Author/Authors :
I and Cerron Zeballos، نويسنده , , E and Crotty، نويسنده , , I and Hatzifotiadou، نويسنده , , D and Lamas Valverde، نويسنده , , J and Neupane، نويسنده , , S and Williams، نويسنده , , M.C.S and Zichichi، نويسنده , , A، نويسنده ,
Abstract :
This Letter describes the multigap resistive plate chamber (RPC). The goal is to obtain a much improved time resolution, keeping the advantages of the wide gap RPC in comparison with the conventional narrow gap RPC (smaller dynamic range and thus lower charge per avalanche which gives higher rate capability and lower power dissipation in the gas gap).