Author/Authors :
Hartmann، نويسنده , , R. and Hauff، نويسنده , , Gary D. and Lechner، نويسنده , , Marc P. and Richter، نويسنده , , R. and Strüder، نويسنده , , L. and Kemmer، نويسنده , , J. and Krisch، نويسنده , , S. and Scholze، نويسنده , , F. and Ulm، نويسنده , , G.، نويسنده ,
Abstract :
The response function of implanted silicon detectors in the soft X-ray region (150 eV-6 keV) has been measured. To reduce signal charge loss in the highly doped p+-region just beneath the detector surface, different techniques of producing shallow doping profiles and enhancing the electric field at the pn-junction are presented. The spectroscopic resolution could be improved significantly. On 〈100〉 detector material, a peak to valley ratio of 5700: 1 for the mangan Kα line was achieved.
asured pulse-height distributions were fitted by a detector model, taking the doping profile of the entrance window into account. The results of the fit were in excellent agreement with the measurement data over the entire energy range.