Author/Authors :
Lee، نويسنده , , Y. and Gough، نويسنده , , R.A. and Kunkel، نويسنده , , W.B and Leung، نويسنده , , K.N. and Perkins، نويسنده , , L.T. and Pickard، نويسنده , , D.S. and Sun، نويسنده , , L. and Vujic، نويسنده , , J. and Williams، نويسنده , , M.D. and Wutte، نويسنده , , D. and Mondelli، نويسنده , , Alfred A. and Stengl، نويسنده , , Gerhard، نويسنده ,
Abstract :
A multicusp ion source has been designed for use in ion projection lithography. Longitudinal energy spreads of the extracted positive hydrogen ion beam have been studied using a retarding field energy analyzer. It has been found that the filament-discharge multicusp ion source can deliver a beam with an energy spread less than 3 eV which is required for the ALG-1000 machine. The multicusp ion source can also deliver the current required for the application.
