Title of article
An application of a new type deposition method to nuclear target preparation
Author/Authors
Sugai، نويسنده , , Isao، نويسنده ,
Pages
10
From page
81
To page
90
Abstract
We have developed a new deposition method, which is based on the vibrational motion of microparticles in the electrostatic field between parallel electrodes. This method is straight forward and does not require any complicated mechanism. It has been found that this deposition technique is useful for the preparation of foils, in both the backed and unbacked condition. The first test results are reported.
Keywords
Powder target , PALLADIUM , osmium , Tungsten , Substrate temperature , Thickness by charged particle reactions , boron , Chromium , nickel , Efficiency of evaporation , Uniformity of target , Focussed sputtering , Molybdenum , Manganese , Beryllium , Purity of target
Journal title
Astroparticle Physics
Record number
2002792
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