Applications of multilayer optics

Recent development of multilayer mirror and its applications in extreme ultraviolet (EUV), soft X-ray ranges in China was reviewed in this paper. Three types of multilayer mirrors were developed with special performance for dense plasma diagnostics, EUV astronomical observation. Firstly, dual-periodic W/B4C multilayer mirror was designed for Kirkpatrick–Baez (K–B) microscopy working at TiKα line (4.75 keV), which is highly reflective both at hard X-ray (CuKα line at 8.05 keV) and soft X-ray (4.75 keV). Using this mirror, the K–B system can be aligned conveniently in air using hard X-ray instead of in vacuum. The second mirror is aperiodic Mg/SiC multilayer, also a bi-functional mirror with high reflectivity for He-II emission line (30.4 nm) but suppressing He-I emission line (58.4 nm) in astronomy observation, which will replace the traditional combination of periodic multilayer and the fragile film filter. This will be more safe in satellite launching. The third mirror is Mo/Si periodic multilayer, depositing on a parabolic substrate with diameter of 230 mm, which is designed for EUV telescope for imaging of solar corona by selecting Fe-XII emission (19.5 nm). The uniformity of lateral layer thickness distribution is within ±0.3% along the diameter of mirror, measured by X-ray reflectometry. The measured peak reflectivity is 42% at the wavelength of 19.5 nm. All these multilayer mirrors were prepared by using magnetron sputtering system in our group.