Author/Authors :
Snigireva، نويسنده , , I. and Snigirev، نويسنده , , A. and Rau، نويسنده , , C. and Weitkamp، نويسنده , , T. and Aristov، نويسنده , , V. M. GRIGORIEV، نويسنده , , M. and Kuznetsov، نويسنده , , S. and Shabelnikov، نويسنده , , L. and Yunkin، نويسنده , , V. and Hoffmann، نويسنده , , M. and Voges، نويسنده , , E.، نويسنده ,
Abstract :
Planar microelectronics technology, involving photolithography and highly anisotropic plasma etching techniques, was applied to fabricate refractive and diffractive (kinoform) lenses. Focusing properties in terms of focus spot and efficiency in the energy range 8–25 keV for both types of lenses were tested at the European Synchrotron Radiation Facility (ESRF) ID22 beamline. Focal spot of 1.5 μm with a gain of 25 was measured at 15 keV.
Keywords :
focusing , Lens , Microfabrication , parabolic , X-rays
