Author/Authors :
Chen-Mayer، نويسنده , , H.H. and Lamaze، نويسنده , , G.P. and Coakley، نويسنده , , K.J. and Satija، نويسنده , , S.K.، نويسنده ,
Abstract :
Boron/phosphorus-doped silicate glass (BPSG) thin films are widely used in microelectronic circuit devices. We employ two neutron techniques to investigate a 200-nm thick BPSG film: neutron depth profiling (NDP) and neutron reflectometry (NR) to obtain complementary information on the boron containing layer.
