Author/Authors :
Jahedi، نويسنده , , N. and Conley، نويسنده , , R. and Shi، نويسنده , , B. and Qian، نويسنده , , J. and Lauer، نويسنده , , K. and Macrander، نويسنده , , A.، نويسنده ,
Abstract :
Scanning electron microscope images obtained on a cross-section of a sputtered multilayer structure have proven to be crucial for qualifying these films for their intended use as a multilayer Laue lens. The quality of the linear Fresnel zone structure is assessed by means of image processing and analyses, and these analyses are then used to qualify the structure for further lens processing. The image analysis as well as problematic SEM artifacts are discussed.
Keywords :
focusing , X-Ray , SEM , Lens , Metrology , Multilayer
