Author/Authors :
Inuzuka، نويسنده , , M. and Hamagaki، نويسنده , , H. and Ozawa، نويسنده , , K. and Tamagawa، نويسنده , , T. and Isobe، نويسنده , , T.، نويسنده ,
Abstract :
We have produced Gas Electron Multiplier (GEM) using the plasma etching method. The new GEM has holes with a cylindrical shape and can hold up to 520 V in nitrogen. Amplification factor was measured as a function of the applied voltage. A gain of 104 was obtained in argon-mixture gases. The gain characteristics are very similar to those of the GEMs made at CERN.
Keywords :
GEM , plasma etching , GEM test setup , GAIN , Cylindrical shape
