Title of article :
Projection XEUV-nanolithography
Author/Authors :
Chkhalo، نويسنده , , N.I. and Salashchenko، نويسنده , , N.N.، نويسنده ,
Abstract :
A short review of present state of the art of projection photolithography is given. Progress and main problems of the EUV lithography have received primary consideration. Advantages of using synchrotrons as sources of EUV radiation in commercial EUV scanners are considered. Present state of the art of EUV lithography in Russia is reported.
Keywords :
Synchrotron radiation , XEUV multilayer optics , Projection EUV lithography
Journal title :
Astroparticle Physics
