Author/Authors :
Kenney، نويسنده , , C.J. and Segal، نويسنده , , J.D. and Westbrook، نويسنده , , E. and Parker، نويسنده , , Sherwood and Hasi، نويسنده , , J. and Da Via، نويسنده , , C. and Watts، نويسنده , , S. A. Morse، نويسنده , , J.، نويسنده ,
Abstract :
Many systems in medicine, biology, high-energy physics, and astrophysics require large area radiation sensors. In most of these applications, minimizing the amount of dead area or dead material is crucial. We have developed a new type of silicon radiation sensor in which the device is active to within a few microns of the mechanical edge. Their perimeter is made by a plasma etcher rather than a diamond saw. Their edges can be defined and also passivated by growing, in an intermediate step, a field oxide on the side surfaces. In this paper, the basic architecture and results from a synchrotron beam test are presented.
Keywords :
Active edge , Silicon radiation detectors , Silicon radiation sensors , 3D