Title of article
Fabrication of back-illuminated, fully depleted charge-coupled devices
Author/Authors
Holland، نويسنده , , S.E and Dawson، نويسنده , , K.S. and Palaio، نويسنده , , N.P. and Saha، نويسنده , , J. and Roe، نويسنده , , N.A. and Wang، نويسنده , , G.، نويسنده ,
Pages
5
From page
653
To page
657
Abstract
We describe a fabrication strategy to produce fully depleted, back-illuminated charge-coupled devices (CCDs). Wafers are partially processed at a commercial foundry using standard processing techniques. The wafers are then thinned to the final desired thickness, and the processing steps necessary to produce back-illuminated devices are performed in our laboratory. The CCDs are then probed at wafer level, and we describe our techniques to screen for gate insulator flaws as well as defects on the back side of the wafer that are important for fully depleted devices.
Keywords
Charge-coupled device , High-resistivity silicon , Fully depleted , Back illuminated , Fabrication techniques
Journal title
Astroparticle Physics
Record number
2029718
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