Author/Authors :
Sasamoto، نويسنده , , Y. and Kawabata، نويسنده , , T. and Hamagaki، نويسنده , , M. and Sugai، نويسنده , , I. and Takeda، نويسنده , , Y.، نويسنده ,
Abstract :
The procedure for the fabrication of self-supporting isotopically enriched 11B targets for the application to nuclear scattering measurements using an electron-beam-excited plasma (EBEP) method was described. A boron target layer of thickness 100±10 μg/cm2 was obtained. The thickness and uniformity of the prepared 11B film were determined by measuring the energy loss of alpha particles across the target area. The purity of the target was examined, and it was found that the investigated boron film contained about 10% impurities.
