Author/Authors :
Roache، نويسنده , , Fergus J.M. and Radjainia، نويسنده , , Mazdak and Williams، نويسنده , , David E. and Gerrard، نويسنده , , Juliet A. and Travas-Sejdic، نويسنده , , Jadranka and Malmstr?m، نويسنده , , Jenny، نويسنده ,
Abstract :
We have developed a simple technique to allow for the lift-off and subsequent transfer of poly(styrene-block-ethylene glycol) films to Transmission Electron Microscopy (TEM) grids. The block copolymer is spin coated onto carbon coated mica and annealed. After the thin film is produced it can easily be floated onto water and picked up by a TEM grid. This method offers better control over film processing than dip coating the TEM grid and is also a significant improvement over methods using etchants such as hydrofluoric acid.
Keywords :
Block copolymer , Nanopattern , Thin film , Transmission electron microscopy
