Thermal decomposition of perfluorodecylsiloxane self-assembled monolayers in air

The thermal decomposition of perfluorodecylsiloxane self-assembled monolayers (SAMs) in air has been studied using atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS), and contact angle analysis. It is found that the monolayers are stable in air up to about 300 °C. Above 350 °C the monolayers primarily decompose through CC bond cleavage, with a gradual reduction in chain length.