Title of article :
AFM study of phase-separated morphology in immiscible blend thin films
Author/Authors :
Seo، نويسنده , , Young-Soo and Kim، نويسنده , , Eusung and Kwon، نويسنده , , Soo Yong and Jing، نويسنده , , Huaiyu and Shin، نويسنده , , Kwanwoo، نويسنده ,
Pages :
5
From page :
1186
To page :
1190
Abstract :
Phase-separation behavior of polystyrene (PS) and poly(methyl methacrylate) (PMMA) 1:1 blend film has been studied as a function of film thickness and component by adding PS-b-PMMA diblock copolymer. After annealing, PS is phase-separated into circular-shaped bumps on a PMMA layer. The bump number is inversely proportional to the film thickness in log–log plot while the slope is invariable for the blends with and without 5% PS-b-PMMA diblock copolymer. The bump size and inter-bump spacing are also affected by both the film thickness and addition of the block copolymer.
Keywords :
Nanopatterning , Nanostructures , Scanning probe microscopy , Polymer thin film
Journal title :
Astroparticle Physics
Record number :
2049002
Link To Document :
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