Title of article
Towards closed-loop control of CVD coating microstructure
Author/Authors
Gevelber، نويسنده , , Michael and Toledo-Quin?ones، نويسنده , , Manuel and Bufano، نويسنده , , Michael، نويسنده ,
Pages
7
From page
377
To page
383
Abstract
The objective of our work is to develop a measurement-based feedback system can enhance the ability to achieve coating microstructure, compensate for process variations (disturbances) and improve the capability of transferring process recipes to different systems. Successful development of an appropriate control structure (i.e. selection and connection of measurements to specific inputs), however, requires an explicit understanding of the process dynamics.
Keywords
chemical vapour deposition , Closed-loop control , Dynamics
Journal title
Astroparticle Physics
Record number
2050438
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