Identification of the first nucleated phase in submonolayer Ti deposited on Si(1 1 1)-7×7 by atomic resolution techniques

Ti5Si4 has been identified to be the first nucleated phase in submonolayer Ti deposited on the Si(1 1 1)-7×7 surface by ultrahigh vacuum scanning tunneling microscopy in conjunction with atomic-resolution transmission electron microscopy. The direct observation of the formation of clusters surrounded by the heavily damaged silicon lattice strongly suggested that Si is the dominant diffusing species in forming the silicide.