Title of article
Transmission properties of hydrogen and helium ion implantation induced waveguide grating structures and potential application
Author/Authors
Hu، نويسنده , , Qin and Zinke-Allmang، نويسنده , , Martin and Sun، نويسنده , , Yingzhi، نويسنده ,
Pages
4
From page
771
To page
774
Abstract
Optical waveguides in fused silica have been manufactured by H+ implantation, which shows significantly improved transmission properties after implantation. The relationship between the transmission property and the thickness of the cladding layer after surface etching has also been investigated. Grating structures in waveguides have been made by additional He+ implantation with a periodic metal mask covering the surface. The transmission of such grating structures is leveled throughout the measured wavelength range. This observation suggests a new method to make variable optical attenuators (VOAs) to equalize optical powers of different channels.
Keywords
Grating structures , optical transmission , Ion implantation , Fused silica
Journal title
Astroparticle Physics
Record number
2051890
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