Title of article :
Anodic behaviour of Al-refractory metal amorphous alloys
Author/Authors :
Wolowik، نويسنده , , A. and Janik-Czachor، نويسنده , , M.، نويسنده ,
Pages :
6
From page :
301
To page :
306
Abstract :
In order to understand the anodic behaviour of AlMo and AlW amorphous alloys in the borate buffer electrolyte, samples of these alloys were polarized galvanostatically. The resultant anodic films were thicker than the passive films formed during potentiodynamic polarization enabling detailed examination of the films and alloy substrates by surface analytical methods. AES investigations suggest that the anodic films formed at low and moderate voltages on AlMo or AlW amorphous alloys consist of Al-oxide, whereas refractory metals remain unoxidized and enriched at the film/substrate interface. Molybdenum and tungsten act as ‘dissolution moderators’, restraining the substrate dissolution process at the film/substrate interface. However, after anodization at high voltages (50 V), AES revealed the presence of an oxidized refractory metal in the inner part of the anodic film. Based on these results of growth of thick anodic films, the role of Mo and W in enhancing the pitting corrosion resistance is discussed.
Keywords :
Amorphous alloys , Sputter deposited alloys , Localized corrosion , Al-base alloys , passivity
Journal title :
Astroparticle Physics
Record number :
2054910
Link To Document :
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