Title of article :
Oxide precipitation in V-doped TiAl-based alloys
Author/Authors :
Cao، نويسنده , , G.H and Liu، نويسنده , , Z.G. and Shen، نويسنده , , G.J. and Liu، نويسنده , , J.-M، نويسنده ,
Pages :
4
From page :
177
To page :
180
Abstract :
Oxide precipitation in V-doped TiAl-based alloys was studied by transmission electron microscopy (TEM). The experimental results showed that the interstitial oxygen in single-phase TiAl alloy precipitates in the form of oxide. A Ti–Al–O ternary oxide was observed and the structure of the precipitated oxide was determined. However, in two-phase TiAl/Ti3Al alloy no oxide was observed. The reasons responsible for the fact that oxide precipitates in TiAl-based alloys were discussed.
Keywords :
Intermetallic compound , Precipitate , Transmission electron microscopy (TEM)
Journal title :
Astroparticle Physics
Record number :
2060225
Link To Document :
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