Title of article :
Binding and diffusion of an al adatom on the hydrogen-terminated si(100) surface
Author/Authors :
Tanida، نويسنده , , Yoshiaki and Ikeda، نويسنده , , Minoru، نويسنده ,
Pages :
4
From page :
131
To page :
134
Abstract :
We studied the initial stage of the adsorption of Al on the hydrogen-terminated Si(100)2 × 1 surface using first-principles calculations with norm-conserving pseudopotentials. By mapping out the adsorption energy of a single Al adatom on the hydrogen-terminated Si surface, we obtain a binding energy of 1.8 eV and an activation energy of 0.6 eV for diffusion both parallel and perpendicular to the Si-dimer rows. We find that the adsorption energy per adatom increases when the number of Al adatoms increases to two or more. We think that the adatoms form clusters, considering the low activation energy and the behavior of the adsorption energy.
Keywords :
Al binding , Al diffusion , Hydrogen termination , Aluminum adsorption , Silicon surface , surface structure
Journal title :
Astroparticle Physics
Record number :
2063866
Link To Document :
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