Title of article
Effect of rapid thermal annealing on the properties of thin carbon films
Author/Authors
Beshkov، نويسنده , , G. and Velchev، نويسنده , , N. and Tzenov، نويسنده , , N. and Milenov، نويسنده , , T. and Lazarova، نويسنده , , V.، نويسنده ,
Pages
4
From page
25
To page
28
Abstract
Carbon films deposited on silicon substrates were studied after rapid thermal annealing (RTA) by Raman spectroscopy and electrical resistance measurements. The temperature and duration of RTA are related to the form and shift of the peaks in the Raman spectra and resistance curve of the films.
Keywords
Thermal annealing , Carbon films , Thin films
Journal title
Astroparticle Physics
Record number
2063932
Link To Document